Seoul Precision Optics

Structures made of multiple layers of thin materials that control the reflection, transmission, and absorption of light via E-B Chamber as well as Sputtering Chamber under 1000 Class clean room.

Uses chemical reactions in a plasma state to finely process the surface of substrates under 100 Class Clean Room. This process allows precise etching of fine structures in semiconductor manufacturing.

It transfers precise patterns at the nanometer scale onto various substrates. This method enables the rapid creation of high-resolution nanostructures.

The key step in semiconductor manufacturing enabling the miniaturization and high integration of integrated circuits under 10 Class Clean Room.

Optical Micro-Electro-Mechanical Systems (MEMS) combine micro-mechanical structures with optical technologies to enable precise manipulation of light